SFB Extra Seminar
In order to reveal the electronic structure of functional materials, we have constructed a new beamline BL-2 MUSASHI (Multiple Undulator beamline for Spectroscopic Analysis of Surface and Hetero-Interface) at Photon Factory, KEK. By the combination of the two undulators and a variable-included-angle varied-line-spacing plane-grating monochromator, the relatively wide-energy-range (30–2,000 eV) light while maintaining high flux and high energy-resolution is available in this beamline. As an endstation, in situ angle-resolved photoemission (ARPES) spectrometer combined with a laser molecular beam epitaxy (MBE) system  is installed. By utilizing the advantage of the beamline, we can measure polarization-dependent ARPES, soft x-ray ARPES, core-level photoemission spectrocscopy (PES), resonant PES, and X-ray absorption spectroscopy on the functional materials, especially the surface and interface of oxide thin films. As recent experimental results carried out at MUSASHI beamline, the in situ PES study on oxide thin films such as La0.6Sr0.4MnO3  and K-adsorbed VO2  are presented.
 K. Horiba et al., Rev. Sci. Instrum. 74, 3406 (2003).
 K. Horiba et al., Phys. Rev. Lett. 116, 076401 (2016).
 D. Shiga et al., in preparation.